\(\rho_{Si\,35}=\cfrac{28.085*0.35}{28.085*0.35+55.845*0.65}*density\,of\,Ferrosilicon\)
This is the density of \(Si\) alone, in a volume of ferrosilicon, \(Si\,35\%\).
\(\rho_{Si\,35}=\cfrac{28.085*0.35}{28.085*0.35+55.845*0.65}*5.65=1.204\,gcm^{-3}\)
\(T_{boom}=295.44^2*\cfrac{28.085*10^{-3}}{3*8.3144}=98.281\,K\) or \(-174.87\,^oC\)
\(T_{p}=295.44^2*\cfrac{28.085*10^{-3}}{2*8.3144}=147.41\,K\) or \(-125.74\,^oC\)
It would be interesting when ferrosilicon \(Si\,\,35\%\) is subjected to these temperatures.